Cyanoadamantyl compounds and polymers and photoresists comprising same

ABSTRACT

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

The present application claims the benefit of U.S. provisionalapplication No. 60/551,448, filed Mar. 8, 2004, which is incorporatedherein by reference in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to cyanoadamantyl compounds, polymers thatcomprise polymerized units of such compounds, and photoresistcompositions that comprise such polymers. Preferred polymers of theinvention have at least one or two distinct repeat units in addition tocyanoadamantyl units and are employed in photoresists imaged atwavelengths less than 250 nm such as 248 nm and 193 nm.

2. Background

Photoresists are photosensitive films used for transfer of images to asubstrate. A coating layer of a photoresist is formed on a substrate andthe photoresist layer is then exposed through a photomask to a source ofactivating radiation. The photomask has areas that are opaque toactivating radiation and other areas that are transparent to activatingradiation. Exposure to activating radiation provides a photoinducedchemical transformation of the photoresist coating to thereby transferthe pattern of the photomask to the photoresist-coated substrate.Following exposure, the photoresist is developed to provide a reliefimage that permits selective processing of a substrate.

While currently available photoresists are suitable for manyapplications, current resists also can exhibit significant shortcomings,particularly in high performance applications such as formation ofhighly resolved sub-quarter micron and even sub-tenth micron features.

Consequently, interest has increased in photoresists that can bephotoimaged with short wavelength radiation, including exposureradiation of below 200 nm such as 193 nm.

Polymers that contain alicyclic groups such as norbornyl are of interestas resin components for photoresists imaged at sub-200 nm wavelengthsdue to the relatively low absorption of such resins to exposureradiation. See U.S. Pat. No. 6,509,134; T. Wallow et al., Proc. SPIE2724 (1996) 334; S. J. Choi, et al., J. Photopolymer Sci. Technology, 10(1997) 521; S. J. Choi et al., Proc. SPIE 3999 (2000) 54; U.S. Pat. Nos.5,843,624; 6,306,554; and 6,517,990; and Japanese Published Application2003-12207.

Efforts to enhance transparency for short wavelength exposure cannegatively impact other important performance properties such assubstrate adhesion and resistance to etchants employed afterdevelopment, which in turn can dramatically compromise image resolution.In particular, reducing aromatic (e.g. phenyl or substituted phenyl suchas phenol) content of a resist to thereby increase transparency atsub-200 nm exposures can provide a resist that exhibits any of poorresistance to plasma etchants used to process substrate surfaces baredupon development, poor adhesion to an underlying substrate, and poor(narrow) lithographic processing windows. See, for instance, U.S. Pat.No. 6,479,211.

Various efforts have been made to improve performance of suchshort-wavelength photoresists. Certain use of photoresist resins thathave certain cyano substitution has been reported. See U.S. PublishedApplications 2003/0186160 and 2003/0008502; and Japanese PublishedApplications 2003-122007 and 2004-29542. Highly useful photoresists thatcomprise a resin with cyano groups are disclosed in U.S. Pat. No.6,692,888 assigned to the Shipley Company.

It thus would be desirable to have new photoresist compositions,particularly resist compositions that can be effectively imaged at shortwavelengths such as sub-250 nm exposure wavelengths.

SUMMARY OF THE INVENTION

We now provide new cyano-substituted adamantyl compounds and polymersthat comprise polymerized units of such compounds. We further providephotoresists that comprise such cyanoadamantyl polymers. Photoresists ofthe invention can offer notably improved performance properties,including enhanced lithographic processing windows, substrate adhesionand resistance to plasma etchants.

The term “cyanoadamantyl compound”, “cyano-substituted adamantylcompound” or other similar term as referred to herein refers to acompound that comprises an adamantyl group and the adamantyl ring issubstituted by a cyano moiety or a group that comprises a cyano moietysuch as cyanoalkyl (e.g. —(C₁₋₈alkylCN) and the like. For manyapplications, preferred are compounds where a cyano moiety is notdirectly covalently linked to an adamantyl ring carbon atom, but isspaced from an adamantyl ring atom by one, two, three, four or moreatoms such as through a cyanoalkyl group. Such spaced cyano moietiesthat are covalently linked to an adamantyl ring through one or moreinterposed atoms are generally referred to as a cyano group that ispendant to the adamantyl ring.

Preferred cyanoadamantyl compounds of the invention further comprise afunctionality that can enable polymerization of the compound. Typically,the cyanoadamantyl compound will comprise an unsaturated moiety, such asa carbon-carbon double bond.

Particularly preferred cyanoadamantyl compounds are acrylate esters,with a cyanoadamantyl moiety comprising at least a portion of the estergroup.

More specifically, preferred cyanoadamantyl compounds of the inventioninclude those of the following Formula I:

-   -   wherein R and R¹ are each hydrogen or alkyl, and R and R¹ are        preferably hydrogen or methyl;    -   each R³ is independently cyano, hydroxy, optionally substituted        alkyl including cyanoalkyl, or optionally substituted        heteroalkyl including cyanoheteroalkyl, with at least one R³        being cyano, optionally substituted cyanoalkyl or optionally        substituted cyanoheteroalkyl;    -   W is a chemical bond or a group that comprises a quaternary        carbon linked to the ester oxygen, e.g. —C(CH₃)₂—; and    -   n is an integer of 1 to 4, more typically n is 1, 2 or 3.

For polymers used for positive-acting photoresist compositions,preferably the cyanaoadamantyl moiety provides a quaternary acrylateester to facilitate photoacid-induced cleavage of the ester. Referenceto a “quaternary cyanoadamantyl ester group” or other similar termindicates that a quaternary carbon of the group comprises an adamantylmoiety and is covalently linked to the ester oxygen, i.e. —C(═O)O-TRwhere T is a quaternary (fully substituted by other than hydrogen)carbon of a group R that comprises a cyanoadamantyl moiety. In at leastmany cases, preferably a quaternary ring carbon of the adamantyl moietywill be covalently linked to the ester oxygen, such as exemplified bycompounds of the below Formulae II, IIa, III and IIIa. However, thequaternary carbon linked to the ester oxygen also can be exocyclic tothe adamantyl ring, typically where the adamantyl ring is one of thesubstituents of the exocyclic quaternary carbon, such as exemplified bycompounds of Formula IV and IVa below.

Polymers of the invention are preferably adapted for use in photoresistsimaged at 248 nm and 193 nm.

For example, for use in 248 nm photoresists, a polymer of the inventionpreferably contains aromatic groups, particularly phenyl groups such asphenolic units. A copolymer or terpolymer that comprises polymerizedunits of vinylphenol and a cyanoadamantyl acrylate ester can bepreferred for use in photoresists imaged at 248 nm.

For use in 193 nm photoresists, a polymer of the invention preferablywill be at least substantially free of aromatic groups such as phenyl.Preferred polymers for use in 193 nm photoresists will contain less thanabout 5 mole percent aromatic groups, more preferably less than about 1mole percent aromatic groups, more preferably less than about 0.1, 0.02,0.04 and 0.08 mole percent aromatic groups and still more preferablyless than about 0.01 mole percent aromatic groups. Particularlypreferred polymers for use in 193 nm photoresists will be completelyfree of aromatic groups. Aromatic groups can be highly absorbing ofsub-200 nm radiation and thus are undesirable for polymers used inphotoresists imaged with such short wavelength radiation.

Also, preferred polymers of the invention, including polymers that areadapted for imaged at 248 nm and 193 nm, will be at least substantiallyfree of fluorine atoms, or in another aspect at least substantially freeof any halogen atoms. Particularly preferred polymers will be completelyfree of fluorine atoms, or in another aspect completely free of anyhalogen atoms. A polymer that is at least substantially free of fluorineatoms or halogen atoms contains less than 2 or 3 number percent offluorine or halogen atoms based on the total number of atoms in thepolymer, more preferably less than 0.5, 1 or 2 number percent offluorine or halogen atoms based on the total number of atoms in thepolymer.

Polymers of the invention may contain units in addition tocyanoadamantyl group. For example, dissolution enhancers may be includedin a polymer of the invention, such as anhydrides and lactones, e.g.polymerized maleic anhydride, itaconic anhydride, and/orα-butyrolactone. Contrast enhancing groups also may be present inpolymers of the invention, such as groups provided by polymerization ofmethacrylic acid, acrylic acid, and such acids protected as photoacidlabile esters, e.g. as provided by reaction of ethoxyethyl methacrylate,t-butoxy methacrylate, t-butylmethacrylate and the like. Polymer groupsthat can provide resistance to plasma etchants also are preferred. Forinstance, for polymers used in photoresists imaged at 248 nm, it can bepreferred to include polymerized styrene units, which can enhance etchresistance. For polymers used in photoresists imaged at 193 nm, it maybepreferable to include polymerized norbornene groups and otherpolymerized units that contain alicyclic groups including both carbonalicyclic groups and heteroalicyclic groups. As referred to herein, theterm “carbon alicyclic group” means each ring member of the non-aromaticgroup is carbon. The carbon alicyclic group can have one or moreendocyclic carbon-carbon double bonds, provided the ring is notaromatic.

Preferred for many resist applications are polymers of the inventionthat comprise repeat units that contain moieties that comprise one morehetero atoms (particularly N, O or S, preferably O or S) such as may bepresent as a component of an alcohol, alkylsulfide, lactone, ester, andthe like. Such hetero-containing groups suitably will be distinct fromphotoacid-labile moieties of a polymer (e.g. photoacid-labile ester oracetal groups), i.e. these hetero groups will not undergo cleavagereactions during typical lithographic exposure and post-exposure baketreatments.

Such hetero-containing groups also may be an oxygen- and/orsulfur-containing heteroalicyclic ring that is preferably fused to thepolymer backbone (i.e. at least two heteroalicyclic ring atoms as partof the polymer backbone). The heteroalicyclic ring has one or moreoxygen and/or sulfur atoms as ring members. Many preferred fusedheteroalicyclic groups will be other than lactones or anhydride, orotherwise will not contain a keto carbon (i.e. >C═O) as a member of thealicyclic ring. For instance, preferred are groups that may be providedby an optionally substituted 3,4-dihydro-2-H-pyran including e.g.3,4-dihydro-2-methoxy-2-H-pyran, 3,4-dihydro-2-ethoxy-2-H-pyran,3,4-dihydro-2-propoxy-2-H-pyran, and the like.

By stating herein that a cyclic group (e.g. a carbon alicyclic orheteroalicyclic group) is fused to a polymer backbone, it is meant thattwo ring members of the cyclic group, typically two adjacent carbonatoms of the cyclic group, are also part of the polymer backbone. Such afused ring can be provided by polymerizing a cyclic monomer that has anendocyclic double bond, e.g. by polymerizing an optionally substitutednorbornene group, optionally substituted 3,4-dihydro-2-H-pyran or othervinyl alicyclic group.

The invention also provides methods for forming relief images, includingmethods for forming a highly resolved relief image such as a pattern oflines where each line has essentially vertical sidewalls and a linewidth of about 0.25 microns or less, and even a width of about 0.10microns or less. The invention also includes methods for manufacture ofan electronic device article such as a processed microelectronicsemiconductor wafer through application and imaging of a photoresist ofthe invention. The invention further provides articles of manufacturecomprising substrates such as a microelectronic wafer substrate havingcoated thereon a polymer, photoresist or resist relief image of theinvention.

Other aspects of the invention are disclosed infra.

DETAILED DESCRIPTION OF THE INVENTION

As discussed above, we now provide new cyano-substituted adamantylcompounds and polymers that comprise polymerized units of suchcompounds.

Preferred compounds and polymers of the invention comprise one or moreadamantyl moieties that contain a cyano moiety-ring substituent, wherethe cyano (—C≡N) functionality itself is not directly covalently linkedto a ring carbon of the adamantyl group, but where the cyanofunctionality is spaced from an adamantyl ring carbon by 1 to about 16other atoms, more typically 1 to about 6 carbons or other atoms, i.e.cyano groups that are “pendant” or spaced by one or more interposedatoms from an adamantyl ring atoms as defined above.

Preferred compounds and polymers of the invention also include one ormore adamantyl moieties where a cyano moiety-ring substituent is presenton the 2 or 4 positions of an adamantyl ring, or other adamantyl ringpositions that have two available valances for substitution.

As discussed above, for many resist applications, preferably compoundsand polymers of the invention will be at least substantially free orcompletely free of fluorine atoms, or at least substantially free orcompletely free of any halogen atoms.

Compounds

As discussed above, preferred cyanaoadamantyl compounds of the inventionfurther comprise a functionality that can enable polymerization of thecompound. Typically, the cyanoadamantyl compound will comprise anunsaturated moiety, such as a carbon-carbon double bond, e.g. preferredare cyanoadamantyl acrylate esters.

Preferred cyanoadamantyl compounds of the invention include those of thefollowing Formula I:

-   -   wherein R, R¹, R³, W and n are as defined above.

As discussed above, preferred are cyanoadamantyl compounds that havecyano group (e.g. cyano, cyanoalkyl, cyanoheteroalkyl) substitution at a2 or 4 adamantyl ring position that has two available valences forsubstitution, i.e. a —CH₂— adamantyl ring atom in the absence of anysubstitution.

In the case of cyanoadamantyl ester compounds of the invention, it isalso preferred that a single 2 or 4 adamantyl ring position issubstituted by both 1) a cyano-containing group ((e.g. cyano,cyanoalkyl, cyanoheteroalkyl) and 2) the ester moiety (i.e. —OC(═O)R).

More particularly, preferred cyanoadamantyl ester compounds of theinvention include compounds of the following Formulae II and Ia:

-   -   wherein in Formula II, R and R¹ are as defined in Formula I        above, and R³ is cyano, optionally substituted cyanoalkyl, or        optionally substituted cyanoheteroalkyl.    -   wherein in Formula IIa, R R¹ are each the same as defined in        Formula I above; and R³ and R⁴ are each independently chosen        from among cyano, hydroxy, optionally substituted alkyl        including cyanoalkyl, or optionally substituted heteroalkyl        including cyanoheteroalkyl, with at least one R³ and R⁴ being        cyano, optionally substituted cyanoalkyl or optionally        substituted cyanoheteroalkyl.

As indicated above, preferred cyanoadamantyl ester compounds of theinvention include compounds methacrylate esters, such as compounds ofthe following Formula III and IIIa:

-   -   wherein in Formula III, W, each R³ and n are the same as defined        in Formula I above;    -   wherein in Formula IIIa, W is the same as defined in Formula I        and R³ is cyano, optionally substituted cyanoalkyl, or        optionally substituted cyanoheteroalkyl.

As discussed, a quaternary carbon linked to an ester group oxygensuitably can be exocyclic to an adamantyl ring of a cyanoadamantylgroup, i.e. where an adamantyl ring atom is not covlanetly linkeddirectly to an ester oxygen. For instance, preferred are compounds ofthe following Formula IV and IVa:

-   -   wherein in Formula IV, R, R¹, R³ and n are the same as defined        in Formula I above;    -   R⁴ and R⁵ are the same or different non-hydrogen substituents        such as optionally substituted alkyl, optionally substituted        carbocyclic aryl such as optionally substituted phenyl,        optionally substituted heteroalkyl, and the like; and

W′ is a linker such as a chemical bond (i.e. W′ absent), optionallysubstituted alkyl, optionally substituted carbocyclic aryl such asoptionally substituted phenyl, optionally substituted heteroalkyl, andthe like;

-   -   wherein in Formula IVa, R and R¹ are the same as defined in        Formula I above,    -   R³ is cyano, optionally substituted cyanoalkyl, or optionally        substituted cyanoheteroalkyl; and

W′, R⁴ and R⁵ are the same as defined in Formula IV above.

Specifically preferred compounds include the following:

-   2-Methyl-acrylic acid 2-cyanomethyl-adamantan-2-yl ester-   2-Methyl-acrylic acid 5-cyano-2-methyl-adamantan-2-yl ester-   2-Methyl-acrylic acid 3-cyano-adamantan-1-yl ester    Polymers

As discussed above, preferred polymers of the invention may comprise twoor more distinct repeat units, where at least one of the repeat unitscomprises a cyanoadamantyl group.

More particularly, preferred polymers may comprise a structure of thefollowing Formula V:

-   -   wherein at least one of A or B comprises a cyanoadamantyl group,        and the other one or two polymer groups may be distinct polymer        units and comprises e.g. a photoacid-labile moiety such as an        acid-labile ester or acetal group; or an anhydride or lactone        such as a maleic anhydride, itaconic anhydride, and/or        α-butyrolactone; or other contrast-enhancing groups such        polymerized units of methacrylic acid, acrylic acid; or an        etch-resistance enhancing group such as polymerized        optionally-substituted styrene, optionally-substituted        alpha-methylstyrene, optionally-substituted norbornene; or other        polymerized esters that comprise an alicyclic group; and the        like;    -   R¹, R² and R³ are each independently hydrogen or optionally        substituted C₁₋₆ alkyl, and preferably R¹, R² and R³ are each        independently hydrogen or methyl; and    -   x, y and z are mole percents of the respective repeat units        based on total polymers units and x and y are each greater than        zero and z can be zero (where the C repeat unit is not present        in the polymer) or greater than zero (where the C repeat unit is        present in the polymer).

As discussed above, preferred are cyanoadamantyl ester compounds andpolymers that contain polymerized groups of such esters. For instance,preferred are polymers that comprise a structure of the a structure ofthe following Formula VI:

-   -   wherein A is a cyanoadamantyl group, and B, C, R¹, R², R³, x, y,        and z are each the same as defined in Formula V above.

As also discussed above, polymers of the invention may comprise avariety of groups distinct from cyanoadamantyl groups.

Thus, for example, polymers of the invention may comprisephotoacid-labile groups that do not contain a cyanoadamantyl group.Preferred are t-butyl esters as well as carbon alicyclic photoacidlabile ester groups. Preferred alicyclic groups of such esters will havea molecular volume of at least about 125 or about 130 Å³, morepreferably a molecular volume of at least about 140 or 160 Å³. Alicyclicgroups larger than about 220 or 250 Å³ may be less preferred, in atleast some applications. References herein to molecular volumesdesignate volumetric size as determined by standard computer modeling,which provides optimized chemical bond lengths and angles. A preferredcomputer program for determining molecular volume as referred to hereinis Alchemy 2000, available from Tripos. For a further discussion ofcomputer-based determination of molecular size, see T Omote et al,Polymers for Advanced Technologies, volume 4, pp. 277-287.

Particularly preferred quaternary alicyclic groups of photoacid-labileunits include the following, where the wavy line depicts a bond to thecarboxyl oxygen of the ester group, and R is suitably optionallysubstituted alkyl, particularly C₁₋₈ alkyl such as methyl, ethyl, etc.

Suitable photoacid-labile groups also will include acetal groups such asmay be provided by reaction of a vinyl ether such as ethyl vinyl etherwith a hydroxy or carboxy group.

Polymers of the invention also may contain heteroalkyl groups, which maypreferably fused to a polymer backbone often in combination with acarbon alicyclic group such as a polymerized optionally substitutednorbornene. Such fused heteroalicyclic groups also are disclosed in U.S.Pat. No. 6,306,354 assigned to the Shipley Company.

Preferred polymers of the invention that contain oxygen heteroalicyclicunits may comprise a structure of the following Formula I:

-   -   wherein X, Y, and each Z are each independently carbon or        oxygen, with at least one of X, Y or Z being oxygen, and        preferably no more than two of X, Y and Z being oxygen;    -   Q represents an optionally substituted carbon alicyclic ring        such as norbornyl fused to the polymer backbone (i.e. two Q ring        members being adjacent carbons of the polymer backbone); the        alicyclic ring suitably having from about 5 to about 18 carbon        atoms and is suitably a single ring (e.g. cyclopentyl,        cyclohexyl or cycloheptyl), or more preferably Q is polycyclic        e.g. and contain 2, 3, 4 or more bridged, fused or otherwise        linked rings, and preferred substituents of a substituted Q        group include photoacid-labile moieties such as a        photoacid-labile ester;    -   each R is the same or different non-hydrogen substituent such as        cyano; optionally substituted alkyl preferably having 1 to about        10 carbon atoms; optionally substituted alkanoyl preferably        having 1 to about 10 carbon atoms; optionally substituted alkoxy        preferably having 1 to about 10 carbon atoms; optionally        substituted alkylthio preferably having 1 to about 10 carbon        atoms; optionally substituted alkylsulfinyl preferably 1 to        about 10 carbon atoms; optionally substituted alkylsulfonyl        preferably having 1 to about 10 carbon atoms; optionally        substituted carboxy preferably have 1 to about 10 carbon atoms        (which includes groups such as —COOR′ where R′ is H or C₁₋₈        alkyl, including esters that are substantially non-reactive with        photoacid); a photoacid-labile group such as a photoacid-labile        ester e.g. a tert-butyl ester and the like; etc.    -   m is 1 (to provide a fused five-membered ring), 2 (to provide a        fused six-membered ring), 3 (to provide a fused seven-membered        ring), or 4 (to provide a fused eight-membered ring);    -   n is an integer of from 0 (i.e. no R ring substituents), 1 (i.e.        a single R ring substituent) to the maximum possible value        permitted by the valences of the ring members, and preferably n        is 0, 1, 2, 3, 4 or 5, and more preferably n is 0, 1, 2 or 3;    -   p is the mole fraction of the fused oxygen ring units based on        total units in the polymer; and r is the mole fraction of the        fused carbon alicyclic ring units based on total units in the        polymer, and p is greater than zero and r is zero (where the        fused carbon alicyclic group is absent) or greater than zero        (where the fused carbon alicyclic group is present in the        polymer).

As referred to herein, the term “alkyl” is intended to include bothbranched and straight-chain saturated aliphatic hydrocarbon groups aswell as alicyclic groups. Examples of alkyl include methyl, ethyl,n-propyl, i-propyl, n-butyl, s-butyl, t-butyl, n-pentyl, and s-pentyl.Preferred alkyl groups are C₁-C₂₂ alkyl groups. An alkyl group includescyclic structures and may contain a multiple carbon-carbon bond providethe group is not aromatic (i.e. the term alkyl includes alicyclic,alkenyl and alkynyl).

As discussed above, references to a “quaternary” carbon indicate thecarbon atom has four non-hydrogen substituents (i.e. CRR¹ R², R³ whereR, R¹, R² and R³ are each the same or different and each is other thanhydrogen). See, for instance, Morrison and Boyd, Organic Chemistry,particularly at page 85 (3^(rd) ed., Allyn and Bacon), for a discussionof those term quaternary. In the case of photoacid-labile esters ofcompounds and polymers of the invention, it is often preferred that aquaternary carbon is directly linked (i.e. covalently linked with noother interpose atoms) to the ester carboxyl oxygen, i.e. linked to theunderlined oxygen of the ester group: —OC(═O)—.

As used herein, “heteroalkyl” is intended to include branched,straight-chain and cyclic saturated aliphatic hydrocarbon groupsincluding alkylene, having the specified number of carbon atoms and atleast one heteroatom, e.g., N, O or S. Heteroalkyl groups will typicallyhave between about 1 and 20 carbon atoms and about 1, 2 or 3heteroatoms, preferably about 1 to 8 carbon atoms Preferred heteroalkylgroups include the following groups. Preferred alkylthio groups includethose groups having one or more thioether linkages and from 1 to 12carbon atoms, more preferably from 1 to 6 carbon atoms. Preferredalkylsulfinyl groups include those groups having one or more sulfoxide(SO) groups and from 1 to 12 carbon atoms, more preferably from 1 to 6carbon atoms. Preferred alkylsulfonyl groups include those groups havingone or more sulfonyl (SO₂) groups and from 1 to 2 carbon atoms, morepreferably from 1 to 6 carbon atoms. Preferred alkoxy group have one ormore ether linkages and 1 to 12 carbon atoms, more preferably from 1 to6 carbon atoms. Preferred aminoalkyl groups include those groups havingone or more primary, secondary and/or tertiary amine groups, and from 1to 12 carbon atoms, more preferably from 1 to 6 carbon atoms.

References herein to a cyanoalkyl group or cyanohetoalkyl group indicatean alkyl or heteroalkyl group as specified above, having cyano groupsubstituent at one or more available positions. A cyanoalkyl orcyanoheteroalkyl group typically has one, two or three cyano moieties,more typically one or two cyano moieties.

As discussed, various moieties may be optionally substituted, includinggroups of Formulae I, II, Ia, III, IIIa, IV and IVa and polymers thatcontain polymerized units of compounds of those formulae, includingpolymers of Formula V and VI above. A “substituted” substituent may besubstituted at one or more available positions, typically 1, 2, or 3positions by one or more suitable groups such as e.g. cyano; C₁₋₈ alkyl;C₁₋₈ alkoxy; C₁₋₈ alkylthio; C₁₋₈ alkylsulfonyl; C₂₋₈ alkenyl; C₂₋₈alkynyl; hydroxyl; nitro; alkanoyl such as a C₁₋₆ alkanoyl e.g. acyl andthe like; etc. Less preferred for many applications will be fluoro otherhalogen substitution as discussed above and such halogen substitution isat least substantially excluded in certain embodiments, as discussedabove.

Syntheses of Compounds and Polymers

Compounds and polymers of the invention can be readily prepared. Forinstance, various adamantyl reagents are commercially available e.g.1-hydroxyadamantane, 2-hydroxyadamantane, 2-adamantanone,1-adamanataneacetic acid, 1-adamantanecarboxylic acid, 1-adamantaneacetic acid, and 1,3-adamantanedicarboxylic acid.

Such compounds can be functionalized to provide a polymerizablecyanoacrylate compound. For instance, cyanomethylbromide (CNCH₂Br) canbe reacted with Mg to form the Grignard reagent which is reacted with2-adamantanone to provide 2-methylcyano-2-hydroxy-adamantyl. Thatmethylcyano-hydroxy-adamantyl compound can be reacted with methacryloylchloride to provide a compound of Formula II as defined above where R ishydrogen, R¹ is methyl and R³ is —CH₂CN, i.e. 2-cyanomethyl-2-adamantylmethacrylate. Similarly, the methylcyano-hydroxy-adamantyl compound canbe reacted with acryloyl chloride to provide a compound of Formula II asdefined above where R and R1 are each hydrogen and R³ is —CH₂CN.

3-Hydroxy-1-adamantane carbonitrile can be prepared by known procedures,e.g. as disclosed in Russian Journal of General Chemistry (Translationof Zhurnal Obshchei Khimii) (2001), 71(7), 1121-1125. That compound alsocan be reacted with methacryloyl chloride or acryloyl chloride toprovide the corresponding 1-3-cyano-adamantyl acrylate esters.

Other cyanoadamantyl reagents are disclosed in K. Petrov et al. ZhurnalOrganicheskoi Khimii (1992), 28(1), 129-32; and R. Bielmann et al.Helvetica Chimica Acta (1982), 65(6), 1728-33.

Polymers of the invention can be prepared by a variety of methods. Onesuitable method is an addition reaction which may include free radicalpolymerization, e.g., by reaction of selected monomers to provide thevarious units as discussed above in the presence of a radical initiatorunder an inert atmosphere (e.g., N₂ or argon) and at elevatedtemperatures such as about 70° C. or greater, although reactiontemperatures may vary depending on the reactivity of the particularreagents employed and the boiling point of the reaction solvent (if asolvent is employed). Suitable reaction solvents include e.g.tetrahydrofuran, ethyl lactate and the like. Suitable reactiontemperatures for any particular system can be readily determinedempirically by those skilled in the art based on the present disclosure.A variety of free radical initiators may be employed. For example, azocompounds may be employed such as azo-bis-2,4-dimethylpentanenitrile.Peroxides, peresters, peracids and persulfates also could be employed.

Other monomers that can be reacted to provide a polymer of the inventioncan be identified by those skilled in the art. For example, to providephotoacid-labile units, suitable monomers include e.g. methacrylate oracrylate that contains the appropriate group substitution (e.g. tertiaryalicyclic, t-butyl, etc.) on the carboxy oxygen of the ester group.Maleic anhydride is a preferred reagent to provide fused anhydridepolymer units. Itaconic anhydride also is a preferred reagent to provideanhydride polymer units, preferably where the itaconic anhydride haspurified such as by extraction with chloroform prior to polymerization.Vinyl lactones are also preferred reagents, such as alpha-butyrolactone.

Some suitable vinyl (endocyclic double bond) heterocyclic monomers thatcan be polymerized to provide polymers of the invention include thefollowing:

Suitably, a polymer of the invention will contain at least about 1 or 5mole percent cyanoadamantyl groups based on total polymer units, morepreferably at least about 10, 15, 20, 25, 30 or 40 mole percentcyanoadamantyl groups based on total polymer units.

Preferably a polymer of the invention will have a weight averagemolecular weight (Mw) of about 800 or 1,000 to about 100,000, morepreferably about 2,000 to about 30,000, still more preferably from about2,000 to 15,000 or 20,000, with a molecular weight distribution (Mw/Mn)of about 3 or less, more preferably a molecular weight distribution ofabout 2 or less. Molecular weights (either Mw or Mn) of the polymers ofthe invention are suitably determined by gel permeation chromatography.

Photoresist Compositions

Polymers of the invention used in positive photoresist formulationsshould contain a sufficient amount of photogenerated acid labile esteror acetal groups or other contrasting-enhancing groups to enableformation of resist relief images as desired. For instance, suitableamount of such acid labile ester groups will be at least 1 mole percentof total units of the polymer, more preferably about 2 to 50 molepercent, still more typically about 3 to 20, 30 or 40 mole percent oftotal polymer units. See the examples which follow for exemplarypreferred polymers.

As discussed above, the polymers of the invention are highly useful as aresin binder component in photoresist compositions, particularlychemically-amplified positive resists. Photoresists of the invention ingeneral comprise a photoactive component and a resin binder componentthat comprises a polymer as described above.

The resin component should be used in an amount sufficient to render acoating layer of the resist developable with an aqueous alkalinedeveloper.

The resist compositions of the invention also comprise a photoacidgenerator (i.e. “PAG”) that is suitably employed in an amount sufficientto generate a latent image in a coating layer of the resist uponexposure to activating radiation. Preferred PAGs for imaging at 193 nmand 248 m imaging include imidosulfonates such as compounds of thefollowing formula:

wherein R is camphor, adamantane, alkyl (e.g. C₁₋₁₂ alkyl) andperfluoroalkyl such as perfluoro(C₁₋₁₂ alkyl), particularlyperfluorooctanesulfonate, perfluorononanesulfonate and the like. Aspecifically preferred PAG isN-[(perfluorooctanesulfonyl)oxy]-5-norbornene-2,3-dicarboximide.

Sulfonate compounds are also suitable PAGs, particularly sulfonatesalts. Two suitable agents for 193 nm and 248 nm imaging are thefollowing PAGS 1 and 2:

Such sulfonate compounds can be prepared as disclosed in European PatentApplication 96118111.2 (publication number 0783136), which details thesynthesis of above PAG 1.

Also suitable are the above two iodonium compounds complexed with anionsother than the above-depicted camphorsulfonate groups. In particular,preferred anions include those of the formula RSO₃— where R isadamantane, alkyl (e.g. C₁₋₁₂ alkyl) and perfluoroalkyl such asperfluoro (C₁₋₁₂alkyl), particularly perfluorooctanesulfonate,perfluorobutanesulfonate and the like.

Other known PAGS also may be employed in the resists of the invention.Particularly for 193 nm imaging, generally preferred are PAGS that donot contain aromatic groups, such as the above-mentionedimidosulfonates, in order to provide enhanced transparency.

A preferred optional additive of resists of the invention is an addedbase, particularly tetrabutylammonium hydroxide (TBAH), ortetrabutylammonium lactate, which can enhance resolution of a developedresist relief image. For resists imaged at 193 nm, a preferred addedbase is a hindered amine such as diazabicyclo undecene ordiazabicyclononene. The added base is suitably used in relatively smallamounts, e.g. about 0.03 to 5 percent by weight relative to the totalsolids.

Photoresists of the invention also may contain other optional materials.For example, other optional additives include anti-striation agents,plasticizers, speed enhancers, etc. Such optional additives typicallywill be present in minor concentrations in a photoresist compositionexcept for fillers and dyes which may be present in relatively largeconcentrations, e.g., in amounts of from about 5 to 30 percent by weightof the total weight of a resist's dry components.

The resists of the invention can be readily prepared by those skilled inthe art. For example, a photoresist composition of the invention can beprepared by dissolving the components of the photoresist in a suitablesolvent such as, for example, ethyl lactate, ethylene glycol monomethylether, ethylene glycol monomethyl ether acetate, propylene glycolmonomethyl ether; propylene glycol monomethyl ether acetate and3-ethoxyethyl propionate. Typically, the solids content of thecomposition varies between about 5 and 35 percent by weight of the totalweight of the photoresist composition. The resin binder and photoactivecomponents should be present in amounts sufficient to provide a filmcoating layer and formation of good quality latent and relief images.See the examples which follow for exemplary preferred amounts of resistcomponents.

The compositions of the invention are used in accordance with generallyknown procedures. The liquid coating compositions of the invention areapplied to a substrate such as by spinning, dipping, roller coating orother conventional coating technique. When spin coating, the solidscontent of the coating solution can be adjusted to provide a desiredfilm thickness based upon the specific spinning equipment utilized, theviscosity of the solution, the speed of the spinner and the amount oftime allowed for spinning.

The resist compositions of the invention are suitably applied tosubstrates conventionally used in processes involving coating withphotoresists. For example, the composition may be applied over siliconwafers or silicon wafers coated with silicon dioxide for the productionof microprocessors and other integrated circuit components.Aluminum-aluminum oxide, gallium arsenide, ceramic, quartz, copper,glass substrates and the like are also suitably employed.

Following coating of the photoresist onto a surface, it is dried byheating to remove the solvent until preferably the photoresist coatingis tack free. Thereafter, it is imaged through a mask in conventionalmanner. The exposure is sufficient to effectively activate thephotoactive component of the photoresist system to produce a patternedimage in the resist coating layer and, more specifically, the exposureenergy typically ranges from about 1 to 100 mJ/cm², dependent upon theexposure tool and the components of the photoresist composition.

As discussed above, coating layers of the resist compositions of theinvention are preferably photoactivated by a short exposure wavelength,particularly a sub-300 and sub-200 nm exposure wavelength. As discussedabove, 193 nm is a particularly preferred exposure wavelength. However,the resist compositions of the invention also may be suitably imaged athigher wavelengths.

Following exposure, the film layer of the composition is preferablybaked at temperatures ranging from about 70° C. to about 160° C.Thereafter, the film is developed. The exposed resist film is renderedpositive working by employing a polar developer, preferably an aqueousbased developer such as quaternary ammonium hydroxide solutions such asa tetra-alkyl ammonium hydroxide solution; various amine solutionspreferably a 0.26 N tetramethylammonium hydroxide, such as ethyl amine,n-propyl amine, diethyl amine, di-n-propyl amine, triethyl amine, ormethyldiethyl amine; alcohol amines such as diethanol amine ortriethanol amine; cyclic amines such as pyrrole, pyridine, etc. Ingeneral, development is in accordance with procedures recognized in theart.

Following development of the photoresist coating over the substrate, thedeveloped substrate may be selectively processed on those areas bared ofresist, for example by chemically etching or plating substrate areasbared of resist in accordance with procedures known in the art. For themanufacture of microelectronic substrates, e.g., the manufacture ofsilicon dioxide wafers, suitable etchants include a gas etchant, e.g. ahalogen plasma etchant such as a chlorine or fluorine-based etchant sucha Cl₂ or CF₄/CHF₃ etchant applied as a plasma stream. After suchprocessing, resist may be removed from the processed substrate usingknown stripping procedures.

All documents mentioned herein are incorporated herein by reference. Thefollowing non-limiting examples are illustrative of the invention.

EXAMPLES 1-2 Syntheses of Cyanoadamantyl Monomers Example 1 Synthesis of2-cyanomethyl-2-adamantyl methacrylate [Formula II: R=H; R¹=CH₃;R³=—CH₂CN]

A three-neck flask under nitrogen is charged with 100 mL toluene and 1gm of cyanomethylbromide (CNCH₂Br) and cooled with an ice bath. A slightmolar excess of Mg is added to the toluene and the mixture stirred untilcompletion of formation of the Grignard reagent. A molar equivalent of2-adamantanone is then added to the reaction mixture and stirringcontinued for 30 minutes or more while warming to room temperature. Thereaction mixture is then again cooled with an ice bath and a slightmolar excess of methacrylol chloride is added dropwise. When the acidchloride addition is complete, the ice bath is removed and stirringcontinued at room temperature until reaction completion. The resulting2-cyanomethyl-2-adamantyl methacrylate can be isolated and purified byextraction and/or chromatography.

Example 2 Synthesis of 3-cyano-adaman-1-yl methacrylate [Formula III:R=H; R¹=CH₃; R³=—CN]

3-Hydroxy-1-adamantane carbonitrile is prepared as disclosed in RussianJournal of General Chemistry (2001), 71(7), 1121-1125. The procedures ofExample 1 above are generally followed to form the acrylate ester of3-hydroxy-1-adamantane carbonitrile and produce the title compound.Thus, a three-neck flask under nitrogen is charged with 100 mL tolueneand 1 gm of 3-hydroxy-1-adamantane carbonitrile and cooled with an icebath. A slight molar excess of methacrylol chloride is added dropwise.When the acid chloride addition is complete, the ice bath is removed andstirring continued at room temperature until reaction completion. Theresulting 3-cyano-adaman-1-yl methacrylate can be isolated and purifiedby extraction and/or chromatography.

EXAMPLES 3-8 Syntheses of Cage and Lactone Monomers Useful in Polymersof the Invention Example 3 Synthesis of Ethyl Fenchol Methacrylate

Materials used: Amount Charged moles Source Ethyl fenchol 182.31 g 1.00Aldrich n-BuLi (2.5 M in 440 mL 1.10 Aldrich hexanes) Methacryloylchloride 112.4 mL 1.15 Aldrich, distilled before use THF anhydrous 600mL Aldrich, degassed before useProcedure:

All reaction glassware and needles were dried and flushed with dry N₂before use and the reaction was carried out under nitrogen atmosphere.

-   1) Into a 2 L 3-neck RBF equipped with an addition funnel and a    magnetic stirrer were added 182.31 g of 2-Ethyl fenchol and 600 mL    of anhydrous THF. The resulting colorless solution was cooled with    an ice-water bath.-   2) A n-BuLi solution (440 mL) was transferred to the addition funnel    via a double-tipped needle and then added to the cooled THF solution    over 30 min. When added, the resulting yellowish solution was kept    in the ice-water bath and stirred for 2 h.-   3) Methacryloyl chloride (112.4 mL, 104.54 g) was added dropwise    over 20 min. The resulting yellow suspension was allowed to warm to    room temperature and stirred overnight.-   4) The LiCl salts were filtered off. The filtrate was cooled in an    ice-water bath while 200 mL of pre-cooled DI water was added. The    resulting solution was stirred for 1.5 h and the organic phase was    isolated (some ether or THF may be added to assist extraction),    washed with DI water (2×200 mL), then saturated Na₂CO₃ solution    (2×200 mL), then DI water (3×200 mL) again, and dried over anhydrous    MgSO₄.-   5) The slightly yellow solution was concentrated on a rotary    evaporator (bath temperature kept below 35°) to yield a clear    slightly yellow liquid product. Yield>90%.-   6) The crude EFMA may be purified to remove the yellow color plus    methacrylic anhydride impurity via flash filtration through    pre-conditioned silica (using hexanes) in Buchner. The monomer is    eluted with hexanes only and comes through in the early eluting    fractions as a colorless liquid when rotovapped. The product was    judged pure by NMR.

Example 4 2-Methyl-2-adamantyl methacrylate

Materials used: Amount Charged moles Source 2-Adamantanone 150.22 g 1.00Lancaster MeLi (1.4 M in Ether) 786 mL 1.10 Aldrich Methacryloylchloride 112.4 mL 1.15 Aldrich, distilled before use THF anhydrous 600mL Aldrich, degassed before useProcedure:

All reaction glassware and needles were dried and flushed with dry N₂before use and the reaction was carried out under nitrogen atmosphere.

-   1) A Methyllithium solution (786 mL) was transferred via a    double-tipped needle to a 2 L 3-neck RBF equipped with an addition    funnel and a magnetic stirrer, and cooled with an ice-water bath.-   2) 2-Adamantanone (150.22 g) was dissolved (over 0.5 h) in anhydrous    THF (600 mL) and the resulting colorless solution was transferred to    the addition funnel via a double-tipped needle and then added to the    cooled MeLi solution over 30 min. When added, the resulting white    suspension was allowed to warm to room temperature and stirred for 2    h.-   3) The white suspension then was cooled using an ice-water bath and    methacryloyl chloride (112.4 mL, 104.54 g) was added dropwise over    20 min. The white solid faded out and a new white (LiCl) suspension    formed. The resulting white suspension was allowed to warm to room    temperature and stirred overnight.-   4) The LiCl salts were filtered off. The filtrate was cooled in an    ice-water bath while 200 mL of pre-cooled DI water was added. The    resulting solution was stirred for 1.5 h and the organic phase was    isolated (some ether or THF may be added to assist extraction),    washed with DI water (2×200 mL), then saturated Na₂CO₃ solution    (2×200 mL), then DI water (3×200 mL) again, and dried over anhydrous    MgSO₄.-   5) The slightly yellow solution was concentrated on a rotary    evaporator (bath temperature kept below 35°) to yield a clear    slightly yellow liquid product. Yield>90%.-   6) The crude MAMA may be purified to remove the yellow color plus    methacrylic anhydride impurity via flash filtration through    pre-conditioned silica (using hexanes) in Buchner. The monomer is    eluted with hexanes only and comes through in the early eluting    fractions as a colorless liquid when rotovapped. The product was    judged pure by NMR.

Example 5 Synthesis of 8-methyltricyclodecanyl methacrylate

A solution of 125 ml of 1.4 M methyl lithium (in ethyl ether) in 100 mlof hexane was decanted into a three neck round-bottom flask at anice-water bath. To it, a solution of 24.00 g oftricyclo[5.2.1.0]decan-8-one in hexane was added dropwise. Afteraddition, the reaction mixture was stirred for 4 hours at 0° C. Then, asolution of 16 ml of methacroyl chloride in 100 ml of hexane was addeddropwise at 0° C. After addition, the reaction mixture was stirred atthe same bath for overnight (16 hours). After filtering the white salts,the organic layer was washed with water three times (3×300 ml). Then,the washed organic layer was dried over anhydrous MgSO₄. The organicsolvent was removed by a rotary pump to give the crude title monomer(23.5 g). The monomer was purified by a flash column chromatography(purity>98%, silica gel with hexane). ¹H NMR: 6.05 (1H), 5.50 (1H), 1.95(3H), 1.65 (3H), 2.25-0.85 (14H).

Example 6 Synthesis of tetrahydro-2-oxo-2-H-furan-4-yl methacrylate

The methacrylate monomer, tetrahydro-2-oxo-2-H-furan-4-yl methacrylatewas synthesized in one step esterification from commercially availablecompound. A mixture of (S)-(−)-α-hydroxy-(-butyrolactone (41.77 g, 0.419mole) and triethylamine (45.32 g, 0.449 mole) in 100 mL of dry THF wasplaced in a three-neck round-bottom flask under a dry nitrogenatmosphere at an ice-water bath. To it, a solution of distilledmethacryloyl chloride (45 mL, 0.461 mole) in 200 ML of dry THF was addedslowly (about 1 hour). During the addition, white precipitation(triethylamine salt) was observed in the reaction mixture. The reactionmixture was stirred over night (about 18 hour). The resultant mixturewas filtered, and the filtrate was concentrated by a rotary pump. Theconcentrated mixture was added 500 mL of ethyl acetate and washed withwater (2×500 mL) twice. The organic layer was dried with anhydrous MgSO₄and concentrated by a rotary pump. The purification of the crude monomerby column chromatography (neutral aluminum oxide, 300 g, hexane, thenhexane/EtoAc=1/1). The purity of the monomer is about 95% (by NMR) and52% yield. ¹H NMR (CDCl₃, ppm): 6.20 (1H), 5.70 (1H), 5.55 & 4.95 (1H),4.55 (dd, 1H), 4.4 (d, 1H), 2.90 (dd, 1H), 2.70 (d, 1H), 1.95 (3H). ¹³CNMR (CDCl₃, ppm): 174.1, 166.5, 135.5, 126.8, 72.9, 70.0, 34.5, 17.9.

Example 7 alpha-Butyrolactone Methacrylate Synthesis

To a 250 ml 3N-RB flask fitted with a gas inlet, thermometer, overheadstirrer and a 125 ml pressure equalizing dropping funnel was added 26.5g triethylamine. The triethylamine was cooled to 5° C. using a water/icebath. Once the triethylamine was at 5° C. the methacrylic acid was addeddropwise over a 20-25 min period. The mixture exothermed ˜10° C. Afterthe addition was complete the water/ice bath was removed. While thesolution was stirring (20 min) the dropping funnel was removed andreplaced with a clean 125 ml pressure equalizing dropping funnel. Thebromolactone (41.25 g)/THF (62.5 ml) was added dropwise over a 30 min.The mixture warmed from ˜18° C. to ˜30° C. with a precipitate forming.The reaction was heated to 55° C. and held at 55° C. for 16 hrs using anoil bath/hot plate. After heating for 16 hrs the mixture was cooled to20° C. using a water/ice bath. The solid (44.5 g) was removed by vacuumfiltration. The filtrates were reduced under partial pressure at 33-34°C. The resulting dark amber/brown oil was diluted with 90 g of methylenechloride. This solution was slowly poured onto a plug of silica gel (180g, Baker 40 um flash chromatography packing) which had beenpre-conditioned with methylene chloride. The crude mixture was allowedto pass into the silica gel plug by gravity. Once the crude mixture hadpassed the surface of the silica gel plug a fresh portion of methylenechloride was slowly poured onto the plug. The methylene chloride waspulled through the silica gel plug using reduced pressure. Once themethylene chloride had passed the surface of the silica gel plug thevacuum was removed then the next portion of methylene chloride wasslowly poured onto the plug. This procedure was followed until all theproduct was extracted. The total filtrate was 850 ml. [The product wasdetected by spotting an aliquot on a TLC plate then illuminating withshort UV.] To the orange filtrate was added 36 g of activated charcoal.The mixture was stirred for 1.5 hrs then filtered through a Celite plug(pre-conditioned with methylene chloride). The charcoal/Celite waswashed with (2×100 ml, 1×50 ml methylene chloride). The filtrate wasthen washed with 2×200 ml D.I. water. The layers were separated and theorganic layer was dried over 100 g of sodium sulfate. The mixture wasstirred for 15-30 min. The sodium sulfate was removed and washed with2×50 ml methylene chloride. The pale yellow filtrate (1.2 L) wasstripped under reduced pressure at 33-34° C. leaving 36.4 g of a paleorange oil, Yield 85.6%.

Example 8 Synthesis of pinanyl methacrylate

Materials used: Amount Charged Moles Source cis-Pinan-2-ol 15.43 g 0.10Fluka Et₃N 12.14 g 0.12 Aldrich, distilled before use Methacryloylchloride 13.07 g 0.125 Aldrich, distilled before use CH₂Cl₂ 230 mLAldrich, dried and distilledProcedure:

All reaction glassware and needles were dried and flushed with dry N₂before use and the reaction was carried out under nitrogen atmosphere.

-   1) Into a 500 mL 3-neck round-bottom-flask equipped with an addition    funnel and a magnetic stirrer were added 15.43 g of cis-pinan-2-ol    and 200 mL of dry CH₂Cl₂ (Stirred over CaH₂ overnight, then    distilled and stored over activated molecular sieves). The resulting    colorless solution was cooled with an ice-water bath.-   2) Triethylamine (12.14 g) was added through the addition funnel to    the cooled CH₂Cl₂ solution over 10 min. After added, the resulting    solution was kept in a dry-ice/acetone bath (−67° C.).-   3) A CH₂Cl₂ (30 mL) solution of methacryloyl chloride (13.07 g) was    added dropwise over 20 min. The resulting orangish suspension was    allowed to warm to room temperature and stirred for 2 h.-   4) The chloride salts were filtered off. The filtrate was washed    with saturated Na₂CO₃ solution (2×200 mL), then DI water (3×200 mL),    and dried over anhydrous MgSO₄.-   5) The slightly yellow CH₂Cl₂ solution was concentrated on a rotary    evaporator (bath temperature kept below 35°) to yield a clear    slightly yellow liquid product. Yield=79%. The product was judged    pure by NMR.

EXAMPLE 9-12 Polymer Synthesis

The following monomers were employed in the syntheses of Examples 9, 10,11 and 12.

Example 9 Synthesis of ECPMA/α-GBLMA/CMAMA terpolymer

15.12 g of ECPMA, 14.12 g of α-GBLMA, and 10.76 g of CMAMA weredissolved in 40 mL of THF. The mixture was degassed by bubbling withnitrogen for 20 min. 2.39 g of V601 (dimethyl-2,2-azodiisobutyrate, 5mol % with respect to monomers) was dissolved in 20 mL of THF andcharged into a 250 mL flask, equipped with a nitrogen inlet and acondenser. After degassing the V601 solution by bubbling with nitrogenfor 20 min, the reactor containing V601 solution was placed in an oilbath kept at 75° C. and the monomer solution was fed into the reactor ata rate of 0.444 mL/min. The monomer feeding was carried out for 3 hours.After monomer feeding was complete, the polymerization mixture wasstirred for additional 1 hour at 75° C. After a total of 4 hourpolymerization time (3 hour feeding and 1 hour stirring), thepolymerization mixture was cooled down to room temperature.Precipitation was carried out in a 1.5 L of isopropyl alcohol. Afterfiltration, the polymer was dried, re-dissolved in 50 g of THF,reprecipitated into 1.5 L of isopropyl alcohol, filtered, and dried in avacuum oven at 50° C. for 48 hours to give 30.98 g (Mw=13,066 andMw/Mn=˜2.02).

Example 10 Synthesis of EAMA/α-GBLMA/CMAMA terpolymer

18.12 g of EAMA, 12.42 g of α-GBLMA, and 9.46 g of CMAMA were dissolvedin 40 mL of THF. The mixture was degassed by bubbling with nitrogen for20 min. 2.1 g of V601 (dimethyl-2,2-azodiisobutyrate, 5 mol % withrespect to monomers) was dissolved in 20 mL of THF and charged into a250 mL flask, equipped with a nitrogen inlet and a condenser. Afterdegassing the V601 solution by bubbling with nitrogen for 20 min, thereactor containing V601 solution was placed in an oil bath kept at 75°C. and the monomer solution was fed into the reactor at a rate of 0.444mL/min. The monomer feeding was carried out for 3 hours. After monomerfeeding was complete, the polymerization mixture was stirred foradditional 1 hour at 75° C. After a total of 4 hour polymerization time(3 hour feeding and 1 hour stirring), the polymerization mixture wascooled down to room temperature. Precipitation was carried out in a 1.5L of isopropyl alcohol. After filtration, the polymer was dried,re-dissolved in 50 g of THF, reprecipitated into 1.5 L of isopropylalcohol, filtered, and dried in a vacuum oven at 50° C. for 48 hours togive 24.32 g (Mw=11,370 and Mw/Mn=˜1.99).

Example 11 Synthesis of MAMA/α-GBLMA/CMAMA terpolymer

17.55 g of MAMA, 12.74 g of α-GBLMA, and 9.71 g of CMAMA were dissolvedin 40 mL of THF. The mixture was degassed by bubbling with nitrogen for20 min. 2.16 g of V601 (dimethyl-2,2-azodiisobutyrate, 5 mol % withrespect to monomers) was dissolved in 20 mL of THF and charged into a250 mL flask, equipped with a nitrogen inlet and a condenser. Afterdegassing the V601 solution by bubbling with nitrogen for 20 min, thereactor containing V601 solution was placed in an oil bath kept at 75°C. and the monomer solution was fed into the reactor at a rate of 0.444mL/min. The monomer feeding was carried out for 3 hours. After monomerfeeding was complete, the polymerization mixture was stirred foradditional 1 hour at 75° C. After a total of 4 hour polymerization time(3 hour feeding and 1 hour stirring), the polymerization mixture wascooled down to room temperature. Precipitation was carried out in a 1.5L of isopropyl alcohol. After filtration, the polymer was dried,re-dissolved in 50 g of THF, reprecipitated into 1.5 L of isopropylalcohol, filtered, and dried in a vacuum oven at 50° C. for 48 hours togive 28.87 g (Mw=12,440 and Mw/Mn=˜1.40).

Example 12 Synthesis of ECPMA/CMAMA/MA/NB tetrapolymer

14.15 g of ECPMA, 13.42 g of CMAMA, 6.34 g of MA, and 6.09 g of NB weredissolved in 40 mL of THF. The mixture was degassed by bubbling withnitrogen for 20 min. 1.19 g of V601 (dimethyl-2,2-azodiisobutyrate, 5mol % with respect to monomers) was dissolved in 20 mL of THF andcharged into a 250 mL flask, equipped with a nitrogen inlet and acondenser. After degassing the V601 solution by bubbling with nitrogenfor 20 min, the reactor containing V601 solution was placed in an oilbath kept at 75° C. and the monomer solution was fed into the reactor ata rate of 0.444 mL/min. The monomer feeding was carried out for 3 hours.After monomer feeding was complete, the polymerization mixture wasstirred for additional 1 hour at 75° C. After a total of 4 hourpolymerization time (3 hour feeding and 1 hour stirring), thepolymerization mixture was cooled down to room temperature.Precipitation was carried out in a 1.5 L of isopropyl alcohol. Afterfiltration, the polymer was dried, re-dissolved in 50 g of THF,precipitated into 1.5 L of isopropyl alcohol, filtered, and dried in avacuum oven at 50° C. for 48 hours to give 18.80 g (Mw=10,660 andMw/Mn=˜1.86).

Example 13 Preparation of a Photoresist of the Invention

A resist of the invention is prepared by admixing the followingcomponents in the following amounts: Component Amount Resin 7.6 wt. % offormulation PAG 5.2 wt. % of resin Basic Additive 0.24 wt. % of resinSurfactant 0.1 wt. % of resin Solvent to provide 92 wt. % fluidfomulation

In the resist, the resin is one of polymers described in Examples 9˜12.The PAG is triphenylsulfonium perfluorobutane sulfonate. The basicadditive is tetrabutylammonium lactate. The surfactant is R08(commercial name MEGAFAC R-08, a fluoroacrylate ester copolymer). Thesolvent is 2-heptanone.

The formulated resist composition is spin coated onto HMDS vapor primed4 inch silicon wafers and softbaked via a vacuum hotplate at 120° C. for90 seconds. The resist coating layer is exposed through a photomask at193 nm, and then the exposed coating layers are post-exposure baked at100° C. The imaged resist layer is then developed by treatment with anaqueous tetramethylammonium hydroxide solution.

The foregoing description of the invention is merely illustrativethereof, and it is understood that variations and modification can bemade without departing from the spirit or scope of the invention as setforth in the following claims.

1. A photoresist composition comprising one or more photoacid generatorcompounds and a resin component, the resin component comprising apolymer that comprises a cyanoadamantyl moiety, the cyanoadamantylmoiety comprising a pendant cyano group.
 2. The photoresist compositionof claim 1 wherein the polymer is at least substantially free ofaromatic groups.
 3. The photoresist composition of claim 1 wherein thepolymer comprises phenolic groups.
 4. The photoresist composition ofclaim 1 wherein the polymer is at least substantially free of fluorineatoms.
 5. A photoresist composition comprising one or more photoacidgenerator compounds and a resin component, the resin componentcomprising a polymer that comprises a cyanoadamantyl moiety and that isat least substantially free of fluorine atoms.
 6. A photoresistcomposition comprising one or more photoacid generator compounds and aresin component, the resin component comprising a polymer that comprisesa cyanoadamantyl moiety, the cyanoadamantyl moiety comprising acyano-containing moiety at the 2 or 4 ring positions of the adamantylgroup.
 7. A method for producing a processed electronic devicesubstrate, comprising: applying a coating layer of a photoresistcomposition on a substrate, the photoresist composition comprising oneor more photoacid generator compounds and a resin component, the resincomponent comprising a polymer that comprises a cyanoadamantyl moiety;exposing the applied photoresist coating layer to patterned radiationhaving a wavelength of 193 nm or 248 nm; and developing the exposedphotoresist layer.
 8. The method of claim 7 wherein the polymercomprises cyano groups that are pendant from an adamantyl moiety and/orthe polymer is at least substantially free of fluorine atoms.
 9. Themethod of claim 6 wherein the substrate is a microelectronicsemiconductor wafer and the photoresist coating layer is exposed withradiation having a wavelength of 193 nm.
 10. An article of manufacturecomprising a substrate having coated thereon a photoresist compositionof claim 1.